THE USE OF NEGATIVE PHOTORESISTS FN-16U SERIES TO PRODUCE A METAL MASK OF REFRACTORY METALS
It was shown that the lift-off photolithography with photoresists FN-16U series gives high-quality metallization of substrates with refractory metals (Pt) without the use of ion-beam etching units. The technology can be used with both projection and contact methods to create image in the photoresist film, as well as to obtain significant savings in precious metal.