Simulation of Forming Multilayer Interface Nanosystems Nb-Co
This paper presents the simulation of forming contact regions (interface) of the multilayer nanosystems niobium-cobalt. The morphology and composition of the interface of a multilayer nanosystem is investigated. It is shown that the morphology of the layer boundaries depends on the temperature of the substrate on which the deposition takes place and, to a large extent, is determined by the preparation of the surface for deposition. The paper considers the modification of the surface by removing defects from the surface of the nanolayer. Modeling of the process showed that the quality of the boundary and the structure of the formed nanofilms largely depend on the preparation of the surface for deposition. Removing (cutting) defects from the surface, as one of the methods of its modernization, can have a different effect on the structure and morphology of the formed nanosystem, depending on the chemical type of the deposited atoms. When atoms with stronger bonds are deposited on the surface of a layer consisting of atoms with less strong bonds, surface modification in the form of preliminary removal of the defect layer is ineffective. Calculations showed that in this case, even the deposition of atoms on a flat surface leads to its deformation, destruction, and the formation of defects. Removal (cutting) of defects from the surface of the layer and atoms with stronger bonds than those of atoms deposited on the surface of the nanolayer is highly effective and noticeably improves the quality of the interface. Note that the efficiency of this operation depends on temperature. The conducted studies can be used as a means of preliminary selection of suitable modes and parameters of technological processes for the manufacture of multilayer nanosystems, predicting their structure, and also used as potential recommendations for improving the functional properties depending on the morphology of the interface of a multilayer nanosystem. The aim of further research is to search for methods of surface modification that provide a high interface quality regardless of the atomic composition of the surface layer and the type of deposited atoms.