DEVELOPMENT OF SOFTWARE FOR AUTOMATED PHOTORESIST APPLICATION UNIT
The level of photolithography technologies and equipment for their implementation is a determining criterion for achieving the required design standards in microelectronics, radioelectronics, optics and microelectromechanical systems. The work is related to the development of the hardware composition of the control system of the automated technological installation for applying photoresist, made in a cluster design with a controlled gas medium, as well as the creation of a package of its software. In accordance with the developed control algorithms, command and sensor signal processing bit grids, as well as operation cyclograms for each module and installation as a whole, a software package was created to control the units and modules of the automated installation of application of the UNF photoresist -200A, logic to the database of technical characteristics of units and modules, as well as process indicators for monitoring these values on the screen. The program consists of several main modules, namely: transport, heat treatment, thermal stabilization, loader, receiver, application, as well as auxiliary modules: database operation, indicator output, logic, interaction with industrial logic controllers and error processing. The developed software works out a number of interlocks introduced to avoid non-scheduled processing of substrates, as well as to fail the installation modules or harm the health of maintenance personnel. The software interface has means of displaying a message about the interlock actuation, as well as methods of unlocking