Development of single-wafer epitaxial reactor
Presents the results of the development of epitaxial reactor. The determining factor in the formation of the plastic deformations are tangential tension from the temperature field along the radius of the substrate. Presents the results of research the substrate holder socket design and method of supporting the substrate. For large-diameter substrates it is advantageous to use the substrate holder with flat socket. Presented results of computer modeling gas-dynamic characteristics the flow in the epitaxial reactor. Using the results of the research were developed epitaxial reactor. Presents the results of research of epitaxial structures.