Microbeam X-ray Lithography Apparatus for Direct Production of Deep LIGA Structures
A microbeam X-ray lithography apparatus, a new device for the direct production of microstructures in thick layers of X-ray resists, in particular, for the fabrication of X-ray lithography masks, was developed on the basis at the LIGA station of the VEPP-3 storage ring of the Siberian Center of Synchrotron and Terahertz Radiation. A microstructure pattern with given arbitrary topology was produced directly in a SU-8 negative resist layer up to 1 mm thick on a substrate moved in a vector mode using a collimated beam of synchrotron radiation with a special software. The design of the device and its technological capabilities and limitations are described. Examples of the fabricated microstructures with a high aspect ratio and X-ray lithography masks are presented.