Properties of plasma sputtering of polycrystalline Pb <sub>1− <i>x</i></sub>Sn <i> <sub>x</sub> </i>Te films with columnar structure
The measurements of the sputtering rates of polycrystalline films of ternary solid solution Pb <sub>1−x</sub>Sn <sub>x</sub>Te (x = 0.16-0.85) with a columnar structure during argon plasma treatment are carried out. The effect of the sputtering rate decrease for the polycrystalline films of lead telluride – tin telluride in comparison with monocrystalline layers is shown and a corresponding physical model is proposed. The features of the formation of nanostructures with the morphology depending on the material sputtering rate on the surface of the polycrystalline Pb <sub>1−x</sub>Sn <sub>x</sub>Te films during plasma treatment are described.