FEATURES OF THE STRUCTURAL PHASE STATE OF A FILM BASED ON A HIGH-ENTROPY AlNbTiZrCu ALLOY SYNTHESIZED BY DEPOSITION OF A MULTIELEMENT METAL PLASMA
This paper presents the results of structural studies of films with a thickness of up to 5 microns of high-entropy alloys of the AlNbTiZrCu system. The films were synthesized on metal and cermet substrates by deposition of a multielement metal plasma created by electric arc plasma assisted simultaneous independent sputtering of several cathodes. It is shown that the films are a layered material and have an amorphous-crystalline structure. It was found that irradiation of films with a pulsed electron beam (18 keV, 20 J/cm<sup>2</sup>, 50 gs, 3 imp., 0,3 s<sup>-1</sup>) is accompanied by crystallization of the material. It is shown that the resulting films are dominated by the compound of the AlNbTiZr composition with the lattice parameter of 0,32344 nm. On the basis of theoretical calculations, the structural data of the crystal AlTi<sub>0,86</sub>Zr<sub>0,95</sub>Nb lattice were obtained, mechanical and thermodynamic characteristics of this compound were determined.