Thermodynamic simulation of BCxNy chemical vapor deposition from N-trimetilborazina and hydrogen mixture
The thermodynamic modelling of the chemical vapour deposition in B - C - N - H system was carried out for B3N3H3(CH3)3 and hydrogen initial mixture at temperatures from 300 to 1300 K, a total pressure from 1.33 to 13,3 Pa. Residual pressure of air in the reactor is source of an impurity of oxygen in considered system. The thermodynamic analysis of B - C - N - H - O and B - C - N - H - O - Не systems shows that in the presence of oxygen the composition of the condensed phases essentially becomes complicated. The deposition conditions of BCxNy are defined.