The boron implantation in the graded-gap МВБ МСТ epilayer
<i>In the paper experimental results on boron implantation of the Cd</i><sub><i>x</i></sub><i>Hg</i><sub><i>1-x</i></sub><i>Te epilayers with various composition near surface of the material are discussed. The electron concentration in the surface layer after irradiation vs irradiation dose and ion energy are investigated for range of doses 10</i><sup><i>11</i></sup><i>-3·10</i><sup><i>15</i></sup><i> cm</i><sup><i>-2</i></sup><i> and energies of 20-150 keV. Also the results of the electrical active defects distribution measurement, carried out by differential Hall method, after boron implantation are represented. Consideration of the received data shows, that composition gradient influence mainly on the various dynamics of accumulation of electric active radiation defects. The electric active defects distribution analysis shows, that the other factors are negligible.</i>