ELECTROCHEMICAL BEHAVIOR OF COBALT SILICIDES IN H2SO4 + HF SOLUTIONS AT HIGH ANODIC POTENTIALS
The voltammetric and impedance characteristics of CoSi2 and Co2Si electrodes were obtained in 0,5 M H2SO4 + x M HF (x = 0,01-0,05) and 0,05 M H2SO4 + 0,01 M HF solutions at the electrode potentials of 1.8 to 3.0 V (nhe). It was shown that the anodic processes on cobalt silicides in H<sub>2</sub>SO<sub>4</sub> + HF solutions involve multiple steps. It is assumed that there are chemical steps in the overall process on Co2Si.