Influence of Parameters of Nanocomposite Layer "Phthalociane:Fullerene" Formation Process on Photoelectric Characteristics of ZnPc:C<sub>60</sub>/C<sub>60</sub> Structures
For the formation of organic photosensitive structures two approaches are used. While using the first approach the photoactive elements of the layered type, in which the active layers are coated in turns and have a sharp heteroboundary, have been created. In the work, another approach, based on forming in the organic photosensitive structures of distributed (bulk) hetero-transition between metal phthalociane and fullerene, has been used. The influence of parameters of forming the nanocomposite layer «phthalociane:fullerene» on the optical and photoelectrical characteristics FTO/ZnPc:C<sub>60</sub>/C<sub>60</sub>/Al and FTO/ZnPc:C<sub>60</sub>/C<sub>60</sub>/BPhen/Al has been considered. The investigated samples have been created by the vacuum thermal deposition method. In the experiment 4 types of the structures with different composition of the active layers have been made. The configuration of the active layers has been changed by varying the evaporated substance mass. For the layer based on zinc phthalocianethe influence of the substrate preheating temperature on the quality of the deposited layers has been investigated and the optimum value of the given temperature has been revealed. The spectra of absorption, transmission and photosensitivity of created samples have been investigated. The transmission spectra contain 2 expressed regions of strong absorption, corresponding to fullerene and zinc phthalociane, respectively. It has been revealed how the change of the fullerene component fraction affects the transport and photoelectric parameters on the nanocomposite layers and structures. The optimum configuration of the active layers ZnPc:C<sub>60</sub>/C<sub>60</sub> has been established. It has been shown that implementation of an additional BPhen layer, blocking the holes, allows a significant increase of the fotoresponse and an extension of the investigated structure sensitivity range.