STUDY OF ADSORPTION PROPERTIES OF NANOSTRUCTURED FILMS BASED ON TIN DIOXIDE
The results of theoretical and experimental studies of surface properties of nanostructured films based on tin dioxide using Fourier-transform infrared spectroscopy, ellipsometry and the indicator method of the distribution of adsorption centers are presented. Etching in inductively coupled plasma was used for additional post-processing of nanostructured films in order to activate the adsorption centers.