ACTIVE ANODIC DISSOLUTION OF NICKEL MONOSILICIDE IN SULPHURIC ACID SOLUTION CONTAINING SODIUM FLUORIDE
Anodic dissolution of NiSi in 0.5 М H <sub>2</sub>SO <sub>4</sub> + (0.005-0.05) М NaF in active range of potentials has been investigated. On the basis of impedance data it has been concluded that at the potentials from -0.08 to 0.04 V. a selective dissolution of nickel from nickel silicide takes place. It has been shown that the diffusion coefficient of nickel in the solid phase increases with the increase of NiSi polarization and NaF concentration. Microscopic and surface profile investigations show a significant development of the NiSi-electrode surface during anodic polarization.