Reactive Deposition of Al<sub>2</sub>O<sub>3</sub> Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode
The conditions of the Al<sub>2</sub>O<sub>3</sub> coatings deposition in a high-current discharge with an evaporating crucible-anode and an additional hollow anode of the ionization system were investigated. Using probe diagnostics and optical spectroscopy, it was determined that an additional hollow anode provides an increase of the ion current density on the surface of the coatings by ~ 2 times and an increase of the atomic oxygen concentration by 1.6–2.6 times. The nanocrystalline Al<sub>2</sub>O<sub>3</sub> coatings were deposited by the method of reactive anodic evaporation and the range of operating parameters was determined within which the α-Al<sub>2</sub>O<sub>3</sub> phase was synthesized at a temperature of 600°C.