Investigation of Silicon Plasma Nanostructuring Technology for Formation ofHighly Efficient Emission Structures
The new methods of silicon nanostructuring and the possibility of increasing the aspect ratios of the formed structures have been considered. It has been shown that the developed technology relates to the self-formation methods and is an efficient tool for improving the quality of the auto-emission cathodes based on the carbon nanotubes (CNT) due to increasing the contact surface area Si-CNT and the heat dissipation increase.